首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Integration of BiFeO3/La0.7Sr0.3MnO3 heterostructures with III-V semiconductors for low-power non-volatile memory and multiferroic field effect transistors
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Integration of BiFeO3/La0.7Sr0.3MnO3 heterostructures with III-V semiconductors for low-power non-volatile memory and multiferroic field effect transistors

机译:BiFeO3 / La0.7Sr0.3MnO3异质结构与III-V半导体的集成,用于低功率非易失性存储器和多铁性场效应晶体管

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We report on the use of SrTiO3 films on GaAs(001) substrates grown by molecular beam epitaxy (MBE) as intermediate buffer layers for the heteroepitaxial growth of ferromagnetic La0.7Sr0.3MnO3 (LSMO) and room temperature multiferroic (ferroelectric/antiferromagnetic) BiFeO3 (BFO) thin films using the pulsed laser deposition technique. The exchange bias coupling effect in the BFO/LSMO heterostructure has been investigated. The magnetization measurements with field cooling exhibit a surprising increment in the magnetic moment with enhanced magnetic hysteresis squareness. This we believe is the consequence of exchange interactions between the antiferromagnetic BFO and the ferromagnetic LSMO at the interface. The integration of BFO materials with LSMO on GaAs substrates facilitated the demonstration of resistive switching based non-volatile memory (NVM) devices which can be faster with lower energy consumption compared to present commercial technologies. Ferroelectric switching observations using piezoresponse force microscopy show polarization switching demonstrating its potential for read-write operation in NVM devices. The ferroelectric and electrical characterization exhibits strong resistive switching with low set/reset voltages. Furthermore, we demonstrate a prototypical epitaxial field effect transistor based on multiferroic BFO as the gate dielectric and ferromagnetic LSMO as the conducting channel. The device exhibits a modulation in channel conductance with a high ON/OFF ratio. This work also demonstrates the first step towards the development of magneto-electronic devices integrated with a compound semiconductor.
机译:我们报告了在分子束外延(MBE)生长的GaAs(001)衬底上使用SrTiO3膜作为中间缓冲层用于铁磁La0.7Sr0.3MnO3(LSMO)和室温多铁(铁电/反铁磁)BiFeO3的异质外延生长(BFO)薄膜使用脉冲激光沉积技术。研究了BFO / LSMO异质结构中的交换偏压耦合效应。磁场冷却下的磁化测量结果显示出磁矩的出乎意料的增加,并增强了磁滞矩形性。我们相信,这是反铁磁BFO和铁磁LSMO在界面处交换相互作用的结果。在GaAs衬底上将BFO材料与LSMO集成在一起有助于演示基于电阻开关的非易失性存储器(NVM)器件,与目前的商业技术相比,这种方法可以更快,能耗更低。使用压电响应力显微镜的铁电开关观察表明,极化开关证明了其在NVM设备中进行读写操作的潜力。铁电和电气特性在低设置/复位电压下显示出很强的电阻开关。此外,我们演示了一个原型外延场效应晶体管,该晶体管基于多铁性BFO作为栅极电介质,铁磁LSMO作为导电通道。该器件具有高导通/截止比的通道电导调制能力。这项工作还证明了开发与化合物半导体集成的磁电子器件的第一步。

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