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Preparation and microcontact printing of platinum and palladium thin films

机译:铂和钯薄膜的制备和微接触印刷

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Thin palladium and platinum films were prepared using a polymeric precursor method. For the first time, down to 30 nm thick films were achieved by this method. A precursor solution consisting of ethylene glycol, citric acid, a metal salt and the corresponding acid was deposited by spin coating onto various substrates. The thermal decomposition behavior of these precursors was characterized by thermal analysis methods. Dried and calcined films were characterized by XRD, UV-Vis and IR spectroscopy as well as resistance measurements to get more information about the film formation. The specific resistance of the phase pure platinum films was as low as 1.1 × 10~(-7) Ω m and that of the palladium films was as low as 6.0 x 10~(-7) Ω m. In addition, a platinum precursor was used for microcontact printing. Regular line patterns with widths between 800 nm and 15 nm were achieved, as could be shown by AFM and SEM,
机译:使用聚合前体方法制备钯和铂薄膜。通过这种方法首次获得了低至30 nm的薄膜。通过旋涂将由乙二醇,柠檬酸,金属盐和相应的酸组成的前体溶液沉积到各种基材上。这些前体的热分解行为通过热分析方法进行了表征。通过XRD,UV-Vis和IR光谱以及电阻测量对干燥和煅烧的薄膜进行表征,以获取有关薄膜形成的更多信息。相纯铂膜的电阻率低至1.1×10〜(-7)Ωm,而钯膜的电阻率低至6.0 x 10〜(-7)Ωm。另外,铂前体用于微接触印刷。如AFM和SEM所示,获得了宽度在800 nm至15 nm之间的规则线条图案,

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