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Vapor phase sensing of ammonia at the sub-ppm level using a perylene diimide thin film device

机译:使用a二酰亚胺薄膜器件的亚ppm级氨气汽相传感

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The fabrication of a two terminal sensor device based on a histidine substituted perylene diimide (PDI-HIS) thin film for the sensitive detection and quantification of ammonia (NH3) vapors by monitoring the changes in its current intensity is reported at room temperature under ambient conditions. The thin film morphological variations of the drop cast PDI-HIS films before and after exposure to NH3 vapors are characterized by FESEM and TEM confirming the diffusion/adsorption of the NH3 vapors. The solution cast PDI-HIS thin film gas sensor device exhibited rapid, highly sensitive and selective vapor phase response towards NH3 with a detection limit as low as 0.56 ppm which is much lower than the maximum permissible limit set for NH3 (25 ppm) for prolonged exposure. Furthermore, control sensing experiments performed using alkyl substituted PDI (PDI-n-octyl) demonstrated that the presence of histidine groups at the imide position of PDI-HIS drastically affects the solid-state aggregation mode as well as redox potential that ultimately enhances the sensing response of the device. The key performance parameters of the device such as sensitivity, response/recovery time, selectivity, recyclability, stability and detection limit demonstrated the protocol as simple, reliable, cost-effective and most efficient in performing NH3 detection under very realistic conditions.
机译:在室温下,在室温下,报道了一种基于组氨酸取代的di二酰亚胺(PDI-HIS)薄膜的两端子传感器设备的制造,该传感器用于通过监测氨电流强度的变化来灵敏地检测和量化氨(NH3)蒸气。 。通过FESEM和TEM表征了滴铸PDI-HIS薄膜在暴露于NH3蒸气之前和之后的薄膜形态变化,从而确认了NH3蒸气的扩散/吸附。溶液浇铸的PDI-HIS薄膜气体传感器装置对NH3表现出快速,高度灵敏和选择性的气相响应,检测限低至0.56 ppm,远低于长期为NH3设定的最大允许限值(25 ppm)接触。此外,使用烷基取代的PDI(PDI-正辛基)进行的控制感测实验表明,在PDI-HIS的酰亚胺位置上存在组氨酸基团会极大地影响固态聚集模式以及最终增强感测的氧化还原电势设备的响应。该设备的关键性能参数,例如灵敏度,响应/恢复时间,选择性,可回收性,稳定性和检测极限,证明该协议简单,可靠,具有成本效益,并且在非常现实的条件下最有效地进行NH3检测。

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