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Synthesis of nitrogen-doped monolayer graphene with high transparent and n-type electrical properties

机译:具有高透明性和n型电性能的氮掺杂单层石墨烯的合成

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A one-step synthesis of a large-area and highly nitrogen-doped graphene (NG) membrane with few defects derived from poly 4-vinyl pyridine (P4VP) has been reported. The synthesis temperature has been optimized by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). With this approach, a large-area of more than 80% single-layer NG membrane with a nitrogen content of 6.37% can be obtained. Scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman mapping-mode, optical microscopy (OM) and transmission electron microscopy (TEM) analyses reveal that the resultant NG is a flat, continuous, uniform and monolayered graphene membrane with a large area and a well-ordered crystalline structure. The electrical measurement confirms the typical n-type field-effect transistors (FETs) for NG both in air and vacuum, and the electron mobility can reach as high as 365 cm(2) V-1 s(-1), much higher than those of NGs previously reported. In addition, the transmittance and sheet resistance of NG correlates well with a monolayered structure and semiconducting properties, which also makes it a candidate of transparent electrode for various optoelectronic devices.
机译:据报道,一步法合成大面积,高氮掺杂的石墨烯(NG)膜几乎没有源自聚4-乙烯基吡啶(P4VP)的缺陷。合成温度已通过拉曼光谱和X射线光电子能谱(XPS)进行了优化。通过这种方法,可以获得面积大于80%的单层NG膜,其中的氮含量为6.37%。扫描电子显微镜(SEM),原子力显微镜(AFM),拉曼映射模式,光学显微镜(OM)和透射电子显微镜(TEM)分析显示,生成的NG是一种平坦,连续,均匀且单层的石墨烯膜,具有大面积和良好的晶体结构。电气测量结果证实了在空气和真空中用于NG的典型n型场效应晶体管(FET),并且电子迁移率可高达365 cm(2)V-1 s(-1),远高于先前报道的NG的那些。另外,NG的透射率和薄层电阻与单层结构和半导体性质良好相关,这也使其成为各种光电器件的透明电极的候选者。

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