首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >The correlation between gate dielectric, film growth, and charge transport in organic thin film transistors: the case of vacuum-sublimed tetracene thin films
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The correlation between gate dielectric, film growth, and charge transport in organic thin film transistors: the case of vacuum-sublimed tetracene thin films

机译:栅极电介质,薄膜生长和有机薄膜晶体管中的电荷传输之间的相关性:真空升华并四苯薄膜的情况

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摘要

The complex interplay of dielectric substrate properties, semiconducting film growth, crystal structure, texture, and charge carrier transport is investigated for the case of tetracene films deposited on different dielectrics (polystyrene, parylene C, polymethylmethacrylate, hexamethyldisilazane-treated SiO2, and untreated SiO2). The tetracene hole mobility, measured in the bottom-gate organic thin film transistor (OTFT) configuration, varies over more than one order of magnitude depending upon the dielectric layer used. Atomic force microscopy and synchrotron grazing incidence X-ray diffraction measurements, analyzed with the extended Rietveld method, were used to investigate the influence of film connectivity, crystalline phase, polymorphism, and texture on charge transport. The role of the surface polarity and the processing conditions of the gate dielectric layer are also discussed. Based on our results, we propose guidelines for the selection of a gate dielectric material favorable for charge transport in tetracene films.
机译:对于在不同电介质(聚苯乙烯,聚对二甲苯C,聚甲基丙烯酸甲酯,六甲基二硅氮烷处理的SiO2和未处理的SiO2)上沉积并四苯膜的情况,研究了介电基板性能,半导体膜生长,晶体结构,织构和电荷载流子传输之间的复杂相互作用。 。在底栅有机薄膜晶体管(OTFT)配置中测得的并四苯空穴迁移率,根据所使用的介电层,变化超过一个数量级。使用扩展的Rietveld方法分析的原子力显微镜和同步辐射掠入射X射线衍射测量用于研究膜连接性,晶相,多态性和织构对电荷传输的影响。还讨论了表面极性的作用和栅极介电层的加工条件。根据我们的结果,我们提出了选择适合于并四苯薄膜中电荷传输的栅极介电材料的准则。

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