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首页> 外文期刊>Journal of neuro-oncology. >Evaluation of serial changes on computed tomography and magnetic resonance imaging after implantation of carmustine wafers in patients with malignant gliomas for differential diagnosis of tumor recurrence
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Evaluation of serial changes on computed tomography and magnetic resonance imaging after implantation of carmustine wafers in patients with malignant gliomas for differential diagnosis of tumor recurrence

机译:评价恶性神经胶质瘤患者卡莫司汀片植入后计算机断层扫描和磁共振成像的系列变化,以鉴别诊断肿瘤复发

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摘要

Carmustine wafers are approved for localized treatment of malignant glioma. In this study, overall changes in computed tomography (CT) and magnetic resonance (MR) images of malignant glioma patients treated with carmustine wafer implantation were evaluated. The subjects were 25 patients undergoing craniotomy for malignant glioma resection and carmustine wafer implantation. Changes in the appearance of wafers, the resection cavity, and the adjacent parenchyma on CT and MR imaging were evaluated retrospectively. On CT, the wafers changed from an initially high-dense to an iso-dense appearance. All MR studies showed a low-intense wafer within 2 days. The wafers changed to a high- or iso-intense appearance on fluid attenuated inversion recovery and T1-weighted imaging, whereas they changed to an iso- to low-intense appearance on T2-weighted imaging. Gas in the cavity increased gradually after surgery, achieved a peak at 1 week postoperatively, and then disappeared in 1-3 months. Increased volume of the resection cavity was observed in 48 % of patients. Regarding changes in the adjacent parenchyma, obvious contrast enhancement at the wall of the resection cavity was seen in 91 % of cases at 1 month, but this disappeared gradually. Edema around the resection cavity was increased in 7 patients (28 %), of whom only two experienced symptoms due to edema. We conclude that these radiological changes after carmustine wafer implantation should be carefully followed up, because these changes can easily be mistaken for infectious disease or recurrent tumors.
机译:卡莫斯汀薄酥饼被批准用于恶性神经胶质瘤的局部治疗。在这项研究中,评估了接受卡莫司汀片植入治疗的恶性神经胶质瘤患者的计算机断层扫描(CT)和磁共振(MR)图像的总体变化。受试者为25例因恶性神经胶质瘤切除术和卡莫司汀片植入术而行开颅手术的患者。回顾性评估了CT和MR成像的晶片外观,切除腔和邻近实质的变化。在CT上,晶圆的外观从最初的高密度变为等密度。所有MR研究均显示2天内存在低强度晶圆。在流体衰减反转恢复和T1加权成像中,晶片变为高或等强度外观,而在T2加权成像中,晶片变为等强度至低强度外观。腔内气体在手术后逐渐增加,在术后1周达到峰值,然后在1-3个月内消失。在48%的患者中观察到切除腔的体积增加。关于邻近实质的变化,在1个月时,有91%的病例在切除腔壁处出现明显的对比度增强,但这种消失逐渐消失。切除腔周围的水肿增加了7例(28%),其中只有两个因水肿而出现症状。我们得出的结论是,应认真跟踪卡莫司汀薄酥饼植入后的这些放射学变化,因为这些变化很容易被误认为是传染病或复发性肿瘤。

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