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首页> 外文期刊>Journal of Nanoelectronics and Optoelectronics >Aluminum-Doped Zinc Oxide Anode for Organic Light Emitting Diodes Grown by Pulsed Laser Deposition Using Plasma-Enhanced Oxygen Radicals
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Aluminum-Doped Zinc Oxide Anode for Organic Light Emitting Diodes Grown by Pulsed Laser Deposition Using Plasma-Enhanced Oxygen Radicals

机译:使用等离子增强氧自由基通过脉冲激光沉积法生长的有机发光二极管用铝掺杂氧化锌阳极

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摘要

We report aluminum-doped zinc oxide (AZO) anode for the organic light emitting diodes (OLEDs) grown by oxygen plasma-enhanced pulsed laser deposition (PE-PLD). AZO film with growth temperature of 400 ℃ and O_2 gas flow rate of 3.5 sccm showed the transmittance of 95% in the visible (400 nm~700 nm) wavelength region, the sheet resistance of 14.9 Ω/cm~2, and the very smooth surface root mean square (rms) roughness of 0.46 nm. Indium tin oxide (ITO) film was compared to the AZO films and OLEDs was fabricated using the ITO film and the AZO films as anode, respectively. The luminous efficiency (cd/A) of the OLEDs including the ITO anode was 1.92 cd/A, meanwhile, 2.37 cd/A of the luminous efficiency was achieved by the OLEDs including the AZO anode with growth temperature of 400 ℃ and O_2 gas flow rate of 3.5 sccm, albeit the surface work function of the AZO anode (=4.67 eV) is lower than that of the ITO anode (= 4.92 eV).
机译:我们报告铝掺杂的氧化锌(AZO)阳极用于通过氧等离子体增强脉冲激光沉积(PE-PLD)生长的有机发光二极管(OLED)。生长温度为400℃,O_2气体流量为3.5 sccm的AZO膜在可见光(400 nm〜700 nm)波长区域显示95%的透射率,薄层电阻为14.9Ω/ cm〜2,并且非常光滑表面均方根(rms)粗糙度为0.46 nm。将氧化铟锡(ITO)膜与AZO膜进行比较,并分别使用ITO膜和AZO膜作为阳极来制造OLED。包括ITO阳极的OLED的发光效率(cd / A)为1.92 cd / A,同时具有AZO阳极且生长温度为400℃和O_2气流的OLED的发光效率为2.37 cd / A。尽管AZO阳极的表面功函数(= 4.67 eV)比ITO阳极的表面功函数(= 4.92 eV)低,但它的速率为3.5 sccm。

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