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Synthesis of Nano-Dimensional ZnQ and Ga Doped ZnO Thin Films by Vapor Phase Transport and Study as Transparent Conducting Oxide

机译:气相传输法合成纳米ZnQ和Ga掺杂ZnO薄膜及其作为透明导电氧化物的研究

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摘要

We report synthesis of polycrystalline ZnO and Ga doped ZnO (ZnO:Ga) thin films (~80 nm) on Si and quartz substrates in a non-vacuum muffle furnace, a simple and cost-effective route, without any catalyst/reactive carrier gases, at relatively low processing temperature of 550℃. The crystalline phases of the films are identified by grazing angle X-ray diffraction (GAXRD). The growth of ZnO films is examined with scanning electron microscope (SEM) as a function of deposition time. An optical transmission of ~90% is observed for pure ZnO film having a resistivity of ~2.1Ω·cm as measured by van der Pauw technique. Doping with Ga results in single phase ZnO:Ga films, retaining an optical transmission of about 80% and three orders of magnitude decrease in resistivity as compared to pure ZnO film.
机译:我们报道了在非真空马弗炉中在硅和石英衬底上合成多晶ZnO和掺杂Ga的ZnO(ZnO:Ga)薄膜(〜80 nm),这是一种简单且经济高效的途径,没有任何催化剂/反应性载气,在较低的550℃处理温度下。膜的结晶相通过掠角X射线衍射(GAXRD)鉴定。 ZnO薄膜的生长用扫描电子显微镜(SEM)作为沉积时间的函数进行检查。通过van der Pauw技术测得的电阻率约为2.1Ω·cm的纯ZnO薄膜的光学透射率约为90%。与纯ZnO膜相比,掺杂Ga会形成单相ZnO:Ga膜,保持约80%的光透射率,并且电阻率降低三个数量级。

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