Effect of Under-Layer Treatment of Ta/TaN Barrier Film on Corrosion Between Cu Seed and Ta in Chemical-Mechanical-Polishing Slurry

摘要

Tantalum/tantalum nitride (Ta/TaN_x) composite film is widely used as a copper (Cu) diffusion barrier layer. In order to reduce via-resistance, an additional argon (Ar) re-sputtering process is used to thin the barrier thickness at the feature bottom. In this study, the effect of Ar re-sputtering of the under-layer of TaN_x barrier films on the corrosion between Cu seeds and upper Ta films in chemical-mechanical-polishing (CMP) slurries was investigated. The results show that Ar re-sputtering of the under-layer of the TaN_x barrier has a strong influence on the corrosion of Cu seeds and Ta films. The equivalent circuit, simulated using data from electrochemical analysis, reveals changes in resistance and capacitance elements of the Cu-Ta electrochemical system, proving that the phase transformation of upper Ta films under different TaN_x conditions leads to different degrees corrosion of Cu seeds and the Ta films.