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Porous silicon and porous polymer substrates for optical chemical sensors

机译:用于光学化学传感器的多孔硅和多孔聚合物基底

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摘要

Mesoporous materials, such as porous silicon and porous polymer gratings (Bragg structures), offer an attractive platform for the encapsulation of chemical and biological recognition elements. These materials include the advantages of high surface to volume ratio, biocompatibility, functionality with various recognition elements, and the ability to modify the material surface/volume properties and porosity. Two porous structures were used for chemical and biological sensing: porous silicon and porous polymer photonic bandgap structures. Specifically, a new dry etching manufacturing technique employing xenon difluoride (XeF_(2)) based etching was used to produce porous silicon Porous silicon continues to be extensively researched for various optical and electronic devices and applications in chemical and biological sensing are abundant. The dry etching technique to manufacture porous silicon offers a simple and efficient alternative to the traditional wet electrochemical etching using hydrofluoric acid. This new porous silicon material was characterized for its pore size and morphology using top and cross-sectional views from scanning electron microscopy. Its optical properties were determined by angular dependence of reflectance measurements. A new class of holographically ordered porous polymer gratings that are an extension of holographic polymer dispersed liquid crystal (H-PDLC) structures. As an alternative structure and fabrication process, porous polymer gratings that include a volatile solvent as the phase separation fluid was fabricated. Porous silicon and porous polymer materials were used as substrates to encapsulate gaseous oxygen (O_(2)) responsive luminophores in their nanostructured pores. These substrate materials behave as optical interference filters that allow efficient and selective detection of the wavelengths of interest in optical sensors.
机译:介孔材料,例如多孔硅和多孔聚合物光栅(Bragg结构),为化学和生物识别元件的封装提供了一个有吸引力的平台。这些材料包括高的表面体积比,生物相容性,具有各种识别元素的功能以及修改材料表面/体积特性和孔隙率的能力。两个多孔结构用于化学和生物感测:多孔硅和多孔聚合物光子带隙结构。具体地,使用基于二氟化氙(XeF_(2))的蚀刻的新干法蚀刻制造技术被用于生产多孔硅。多孔硅在各种光学和电子设备中得到了广泛的研究,并且在化学和生物感测中的应用非常丰富。制造多孔硅的干法蚀刻技术提供了一种简单有效的替代方法,可替代传统的使用氢氟酸的湿法电化学蚀刻。使用扫描电子显微镜的俯视图和横截面图来表征这种新型多孔硅材料的孔径和形态。它的光学特性是由反射率测量的角度依赖性决定的。一类新的全息有序多孔聚合物光栅,是全息聚合物分散液晶(H-PDLC)结构的扩展。作为替代的结构和制造工艺,制造了包括挥发性溶剂作为相分离流体的多孔聚合物光栅。多孔硅和多孔聚合物材料被用作在其纳米结构孔中封装气态氧(O_(2))响应发光体的基质。这些基板材料起着光学干涉滤光片的作用,可以有效,选择性地检测光学传感器中感兴趣的波长。

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