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首页> 外文期刊>Journal of nanoparticle research: An interdisciplinary forum for nanoscale science and technology >Field emission properties originated from 2D electronics gas successively tunneling for 1D heterostructures of ZnO nanobelts decorated with In _2O _3 nanoteeth
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Field emission properties originated from 2D electronics gas successively tunneling for 1D heterostructures of ZnO nanobelts decorated with In _2O _3 nanoteeth

机译:场发射特性源自二维电子气体连续隧穿In _2O _3纳米牙齿修饰的ZnO纳米带的一维异质结构。

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摘要

ZnO-In _2O _3 one-dimensional (1D) nanosized heterostructures constructed by ZnO belts and In _2O _3 tooth-like particles were self-assembled on single crystal silicon substrate using thermal chemical vapor transport and condensation without being aided by any metal catalyst. The morphology, structure, and composition of the as-synthesized 1D heterostructures were analyzed in detail. The widths of the ZnO nanobelts ranged from several tens of nanometers to one micrometer, and the lengths ranged from several tens to one hundred of micrometers. In _2O _3 tooth-like nanoparticles with sizes of about 50-100 nm were found grown at two edges of ZnO nanobelts. ZnO nanobelts grew along [101 0] direction, whereas In _2O _3 nanoteeth grew along [311], [31 1], [3 1 1], and [3 11] directions so as to form rhombus-shaped structures. The growth mechanism of the nanosized heterostructures was discussed on the basis of the vapor-solid process and polar surface effect of ZnO nanobelts. Field emission characteristics of the as-prepared heterostructures were measured and explained by energy band theory of heterostructure in detail. It is important to note that the 2D electronics gas (2DEG) was formed between the ZnO energy band bending down and the interface of the heterostructure. The successive tunneling of 2DEG that took place from ZnO to In 2O 3 and then from In _2O _3 to vacuum was the main reason resulting in electronics emission for the nanosized heterostructures in the process of field emission.
机译:由ZnO带和In _2O _3齿状颗粒构成的ZnO-In _2O _3一维(1D)纳米异质结构利用热化学蒸汽传输和冷凝作用在单晶硅基板上自组装,而无需任何金属催化剂的辅助。详细分析了合成后的一维异质结构的形态,结构和组成。 ZnO纳米带的宽度为几十纳米至一微米,长度为几十至一百微米。在_2O _3齿状纳米颗粒中发现生长在ZnO纳米带的两个边缘,尺寸约为50-100 nm。 ZnO纳米带沿[101 0]方向生长,而In _2O _3纳米带沿[311],[31 1],[3 1 1]和[3 11]方向生长,从而形成菱形结构。基于ZnO纳米带的气固过程和极性表面效应,探讨了纳米异质结构的生长机理。通过异质结构的能带理论对所制备异质结构的场发射特性进行了测量和解释。重要的是要注意,在向下弯曲的ZnO能带与异质结构的界面之间形成了2D电子气(2DEG)。从ZnO到In 2O 3然后从In _2O _3到真空依次发生2DEG隧穿是造成场发射过程中纳米级异质结构电子发射的主要原因。

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