Maskless laser direct imaging lithography using a 355-nm UV light source in manufacturing of flexible fine dies

摘要

This paper describes the results of the application of laser direct imaging (LDI) lithography for dimensional tolerance improvement through surface treatment of cutting edge in the flexible fine dies (FFD). Laser direct imaging lithography was successfully performed on AISI W1-8 substrates by a specifically designed laser system using UV 355 nm light source. The characteristics of patterned line width according to conditions such as scan speed and multi pass were investigated by optical microscope. The average line width of LDIed patterns was observed to be about 1 mm. The experimental results show that the line width of patterned samples was reduced with increasing scan speed and decreasing repetition number (R/N) of scanning. This conclusion proves the feasibility in the selectively application for manufacturing flexible fine die.