Thickness measurement of nanometer films by XRD on nano-multilayers

摘要

Thickness measurement and control have been an essential problem in the research and production of vacuum deposited thin films. As nanometer films have been widely used in some newly developed fields, such as microelectronics and optics, all these applications give rise to stricter requirements of accurate thickness measurement. Compared with micrometer films, there exist special difficulties in measuring the thickness of nanometer films by traditional methods. Besides higher demand of apparatus precision and measurement range, the main difficulties come from.