The unique properties of diamond films, such as excellent tribological properties, optical transparency (from UV to far IR), chemical inertness, high electrical insulation, high thermal conductivity, etc. make diamond films attractive for a wide range of optical, electronic, and tribological applications [1-8]. Low temperature growth of diamond films is important for extending these applications. High quality polycrystalline diamond films can be grown at substrate temperatures of 800-1000 °C using the conventional chemical vapour deposition (CVD) method. Diamond growth at temperatures lower than 800 °C has been investigated using a variety of process and gas systems [9], In these gas systems, small concentrations of oxygen and a large concentration of atomic hydrogen play important roles in the low temperature growth of diamond film. Low temperature usually results in a low growth rate of diamond film and deterioration of film quality.
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