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首页> 外文期刊>Journal of Materials Science >Electroplating of zirconium and aluminum hydroxide thin films following anodic dissolution of corresponding metal anodes in organic medium
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Electroplating of zirconium and aluminum hydroxide thin films following anodic dissolution of corresponding metal anodes in organic medium

机译:在有机介质中阳极溶解相应的金属阳极后,电镀锆和氢氧化铝薄膜

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Zirconium (IV) hydroxide or hydrate oxide films, which are typically difficult to prepare by electrochemical methods using aqueous solutions, are easily fabricated in an acetone bath using Zr anodes as the metal sources and a metal-free solvent containing halide ions as the supporting electrolyte. This method is also confirmed to be applicable to aluminum anodes. In the early stage of electrolysis, anodic oxidation of the metal anode proceeds in the presence of water as an impurity in the solvent. Subsequently, pitting corrosion of the oxide film on the metal anode occurs as a result of the action of halide ions. The corrosiveness of the halogen additive appears to be an important factor determining the dissolution or deposition of metal species in this stage. That is, Br- is more active for electrochemical dissolution of a passive oxide film on the anode compared to I-. Finally, Zr species are deposited on the cathode surface via reactions with cathodically generated hydroxide ions. In these processes, the metal plate acts as a soluble anode and as a metal source for electrodeposition. The coating of Zr (IV) hydroxide film on a stainless steel substrate is shown to act as an effective barrier against electrolytic corrosion. (C) 2004 Kluwer Academic Publishers.
机译:氢氧化锆(IV)或水合氧化锆薄膜通常很难通过使用水溶液的电化学方法制备,很容易在丙酮浴中使用Zr阳极作为金属源,并使用不含卤离子的无金属溶剂作为支持电解质来制备。还证实了该方法适用于铝阳极。在电解的早期阶段,金属阳极的阳极氧化是在溶剂中存在水作为杂质的情况下进行的。随后,由于卤离子的作用,金属阳极上的氧化膜发生点蚀。卤素添加剂的腐蚀性似乎是决定该阶段金属物质溶解或沉积的重要因素。即,与I-相比,Br-对于阳极上的钝化氧化物膜的电化学溶解更具活性。最后,Zr物质通过与阴极生成的氢氧根离子发生反应而沉积在阴极表面上。在这些过程中,金属板充当可溶阳极和电沉积金属源。显示在不锈钢基材上的氢氧化Zr(IV)膜涂层可有效抵抗电解腐蚀。 (C)2004 Kluwer学术出版社。

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