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首页> 外文期刊>Journal of Materials Science >Dopant-dependent oxidation behavior of alpha-SiAlON ceramics
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Dopant-dependent oxidation behavior of alpha-SiAlON ceramics

机译:α-SiAlON陶瓷的掺杂剂依赖性氧化行为

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Oxidation behavior of alpha-SiAlON ceramics doped with Yb, Y, Nd, Ca and Li to the same general molecular formulation was studied at 1000degrees-1300degreesC in dry oxygen. Oxidation resistance of alpha-SiAlON ceramics increased in order of Li, Ca, Nd, Y, and Yb dopants. Oxide layers grown on Nd-, Y-, and Yb-doped samples were dense and crack-free whereas those formed on Ca- and Li-doped samples were porous. The dopant-dependent oxidation behavior of alpha-SiAlON ceramics can be attributed to the effect of the dopants on refractoriness of grain boundary phases and oxide layers as well as to the associated changes in the rate of grain boundary diffusion of dopants and oxygen diffusion in the oxide layers. (C) 2004 Kluwer Academic Publishers.
机译:研究了掺有Yb,Y,Nd,Ca和Li的α-SiAlON陶瓷在干燥氧气中于1000℃至1300℃下的氧化行为。 α-SiAlON陶瓷的抗氧化性按Li,Ca,Nd,Y和Yb掺杂的顺序增加。在掺Nd,Y和Yb的样品上生长的氧化物层致密且无裂纹,而在掺Ca和Li的样品上形成的氧化物层是多孔的。 α-SiAlON陶瓷的依赖于掺杂剂的氧化行为可以归因于掺杂剂对晶界相和氧化物层耐火性的影响,以及掺杂剂中晶界扩散速率和氧扩散速率的相关变化。氧化物层。 (C)2004 Kluwer学术出版社。

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