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首页> 外文期刊>Journal of Materials Science >Influence of the annealing temperature on violet emission of ZnO films obtained by oxidation of Zn film on quartz glass
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Influence of the annealing temperature on violet emission of ZnO films obtained by oxidation of Zn film on quartz glass

机译:退火温度对石英玻璃上氧化锌膜获得的氧化锌膜紫光发射的影响

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The photoluminescence (PL) emission properties of ZnO films obtained on quartz glass substrate by the oxidation of Zn films with the oxygen pressure of 50Pa at temperature of 773 K similar to 973 K were studied. The strong single violet emission centering on 424 nm (or 2.90 eV) without any accompanying deep-level emission and UV emission was observed in the PL spectra of the ZnO films at room temperature. The intensity of violet emission increased with increasing annealing temperature in the range of 773 K similar to 873 K and decreased with increasing annealing temperature in the range of 873 K similar to 973 K. These violet emission bands are attributed to the electron transition from interstitial zinc (Zn-i) level (2.91 eV) to the valence band. (c) 2006 Springer Science + Business Media, Inc.
机译:研究了在773 K的温度下,在773 K的温度下以50Pa的氧气压力氧化Zn膜而在石英玻璃基板上获得的ZnO膜的光致发光(PL)发射特性。在室温下,在ZnO薄膜的PL光谱中观察到以424 nm(或2.90 eV)为中心的强紫色发射光,没有任何伴随的深能级发射和UV发射。紫光发射强度随在773 K附近的773 K范围内的升高的退火温度而增加,而在与973 K类似的873 K范围内的退火温度随强度的升高而降低。这些紫光发射带归因于间隙锌的电子跃迁价带的(Zn-i)水平(2.91 eV)。 (c)2006年Springer Science + Business Media,Inc.

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