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首页> 外文期刊>Journal of Materials Science >Electronic structures of Mg(3)Pn(2) (Pn=N, P, As, Sb and Bi) and Ca3N2 calculated by a first-principle pseudopotential method
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Electronic structures of Mg(3)Pn(2) (Pn=N, P, As, Sb and Bi) and Ca3N2 calculated by a first-principle pseudopotential method

机译:用第一性原理pseudo势法计算的Mg(3)Pn(2)(Pn = N,P,As,Sb和Bi)和Ca3N2的电子结构

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Electronic structure calculations for Mg3N2, Mg3P2, Mg(3)AS(2) (low and high temperature modifications), Mg3Sb2, Mg3Bi2, and Ca3N2 have been performed. Mg3Sb2 is predicted to be an indirect semiconductor with the gap value of about 0.41 eV. Mg(3)AS(2) with a high temperature modification is also predicted to be a semiconductor with the gap value of about 1.1 ev, but the valence band maximum and the conduction band minimum of Mg3Bi2 contacts at Gamma which would make it a sernimetal. Mg3N2, Mg3P2, and Mg(3)AS(2) (low temperature phase) are semiconductors with the direct band gaps of 1.64 eV, 1.73 eV, and 1.57 eV, respectively. Ca3N2 is a semiconductor with a gap of about 1.2 eV. (c) 2006 Springer Science + Business Media, Inc.
机译:已执行了Mg3N2,Mg3P2,Mg(3)AS(2)(低温和高温改性),Mg3Sb2,Mg3Bi2和Ca3N2的电子结构计算。预计Mg3Sb2是间隙值为约0.41 eV的间接半导体。高温修饰的Mg(3)AS(2)也被预测为间隙值为1.1 ev的半导体,但是Mg3Bi2的价带最大值和导带最小值在Gamma处接触,这使其成为一种微细金属。 。 Mg3N2,Mg3P2和Mg(3)AS(2)(低温相)是直接带隙分别为1.64 eV,1.73 eV和1.57 eV的半导体。 Ca3N2是一种间隙约为1.2 eV的半导体。 (c)2006年Springer Science + Business Media,Inc.

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