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首页> 外文期刊>Journal of Materials Science >Hardness of titanium carbide films deposited on silicon by pulsed laser ablation
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Hardness of titanium carbide films deposited on silicon by pulsed laser ablation

机译:脉冲激光烧蚀沉积在硅上的碳化钛膜的硬度

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摘要

Hardness of titanium carbide films deposited on silicon (111) substrate by pulsed laser ablation is evaluated in dependence on laser beam fluence and the film thickness. Measurements were performed with the use of a common microhardness testing equipment, the indenter penetartion depth being more than thickness of the coating. Two methods based both on a law-of-mixtures approach were employed to calculate the film hardness from the measured hardness of the composite film-substrate system. One of them accounts for the indentation size effect. The hardness is revealed to reduce significantly with an increase of the film thickness and the laser beam fluence. (C) 2001 Kluwer Academic Publishers. [References: 19]
机译:取决于激光束通量和膜厚,评估通过脉冲激光烧蚀沉积在硅(111)衬底上的碳化钛膜的硬度。使用通用的显微硬度测试设备进行测量,压头穿透深度大于涂层的厚度。基于混合律法的两种方法都被用来从复合膜-基材体系的测得硬度计算出膜硬度。其中之一说明了缩进大小的影响。随着膜厚度和激光束通量的增加,硬度显着降低。 (C)2001 Kluwer学术出版社。 [参考:19]

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