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Effects of Chemical Surface Treatments on Field Emission of Diamond Film

机译:化学表面处理对金刚石膜场发射的影响

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Field emission of diamond film was enhanced aftersurface treatments using boiling HCl and aqua regia solutions.The current generated by the emission of electron was increasedand the threshold field was reduced from 18.1 to 13.8 V/#mu# mby the surface treatment. The surface roughness was increased by24.4 percent with aqua regia treatment, but the calculatedcurrent-voltage curves were not consistent with the measured ones.It was found that the binding energies of C-C and C-O bonds wereincreased after the aqua regia treatment and the Fermi level ofthe aqua-rigia-treated surface was increased by 2.2 eV. Thisprovides evidence that the enhancement of electron emissionoriginated from the reduction of work function, caused by thechemisorption of oxygen atoms. The effective electron affinitychanged to negative, leading to the reduction of the potentialbarrier height and width for electron emission at the surface of diamond.
机译:使用沸腾的HCl和王水溶液进行表面处理后,金刚石膜的场发射得到增强。通过表面处理,电子发射产生的电流增加,阈值场从18.1 V /#mu#m减小。王水处理后表面粗糙度增加了24.4%,但计算出的电流-电压曲线与实测值不一致。发现王水处理后CC和CO键的结合能增加,费米能级增加经水处理的表面的表面积增加了2.2 eV。这提供了证据,表明由于氧原子的化学吸附而导致的电子发射增强是由于功函数的降低。有效电子亲和力变为负,导致金刚石表面电子发射的势垒高度和宽度减小。

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