The effect of Ne~+ ion implantation on polyimide film

摘要

The fluence of Ne~+ ion irradiation on the surface modification of polyimide (Kapton HN type) film was investigated. The irradiation of ion implantation onto a polyimide film was performed, and the surface chemical structure was analyzed in detail by X-ray photoelectron spectroscopy (XPS). An acceleration voltage of 100 keV was used in the ion implantation with different doses from 5 x 10~(14) to 5 x 10~(17) ion cm~(-2) and a beam current density of 10 μA cm~(-2). The elemental ratios of carbon, oxygen and nitrogen were calculated from 1s peaks of the corresponding elements. The results showed that the content of carbon in the surface layer increased after ion irradiation, while the ratios of oxygen decreased after irradiation, especially in the case of the polyimide film treated at ion fluence. The Ols spectra after ion irradiation are related to the rearrangement of those recoil atoms and the ion incorporated into the film and the formation of new types of bond, such as C-O and O-O.