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Lead zirconium titanate thin films prepared by thermal annealing of multilayer structures composed of PbO, ZrO2 and TiO2

机译:通过对由PbO,ZrO2和TiO2组成的多层结构进行热退火而制备的钛酸锆锆铅薄膜

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摘要

Lead zirconium titanate [Pb(Zr_xTi_(1-x)O3 or PZT] thin films were prepared by the thermal annealing of multilayer films composed of binary oxide layers of PbO, ZrO2 and TiO2. The binary oxides were deposited by metal organic chemical vapor deposition. An interdiffusion reaction for perovskite PZT thin films was initiated at approximately 550 °C and nearly completed at 750 °C for 1 h under O2 annealing atmosphere. The composition of Pb/Zr/Ti in perovskite PZT could be controlled by the thickness ratio of PbO/ZrO2/TiO2 where the contribution of each binary oxide at the same thickness was 1:0.55:0.94. The electrical properties of PZT (Zr/Ti = 40/60, 300 nm) prepared on a Pt-coated substrate included a dielectric constant ε_r of 475, a coercive field E_c of 320 kV/cm, and remnant polarization P_r of 11 μC/cm~2 at an applied voltage of 18 V.
机译:钛酸锆铅[Pb(Zr_xTi_(1-x)O3或PZT]薄膜是通过对由PbO,ZrO2和TiO2二元氧化物层组成的多层膜进行热退火而制备的,该二元氧化物通过金属有机化学气相沉积法沉积钙钛矿型PZT薄膜的互扩散反应是在O2退火气氛下于550°C左右开始的,在750°C的条件下几乎完成了1 h,钙钛矿型PZT中Pb / Zr / Ti的组成可以通过控制膜厚的比例来控制。 PbO / ZrO2 / TiO2,其中每个二元氧化物在相同厚度下的贡献为1:0.55:0.94。在涂有Pt的基板上制备的PZT(Zr / Ti = 40/60,300 nm)的电性能包括电介质常数ε_r为475,矫顽场E_c为320 kV / cm,在18 V施加电压下的剩余极化P_r为11μC/ cm〜2。

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