Polarized XAFS study of Mg K-edge for MgB2 on ZnO

摘要

Polarization-dependent Mg K-edge XAFS study was carried out for MgB 2 films epitaxially deposited by MBE method on ZnO single crystal. 50 and 150 nm MgB2 films were deposited on the O-plane side of the ZnO single crystal. The investigation for the O-plane side of ZnO is interesting because the local structure of MgB2 should be affected by Mg-O interaction on the ZnO. The results indicate that the structure of 50 nm MgB2 film was expanded in the a-b plane and compressed along the c-axis, but that of 150 nm MgB2 was relaxed on the ZnO surface and should be close to the MgB2 crystalline phase.