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首页> 外文期刊>Journal of Electron Microscopy >Evaluation of TEM samples of an Mg-Al alloy prepared using FIB milling at the operating voltages of 10 kV and 40 kV.
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Evaluation of TEM samples of an Mg-Al alloy prepared using FIB milling at the operating voltages of 10 kV and 40 kV.

机译:使用FIB铣削在10 kV和40 kV的工作电压下对Mg-Al合金的TEM样品进行评估。

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摘要

Transmission electron microscopy (TEM) samples of an Mg-Al alloy has been prepared using a Ga-focused ion beam (FIB) milling at two different operating voltages of 10 kV and 40 kV to investigate the influence of the FIB energy on the sample quality. The fine structures of the samples have been studied using a high resolution TEM, and the concentration of the implanted Ga was analysed using an energy dispersive X-ray (EDX) analysis. The result of the TEM observation revealed that point defects were introduced to the sample finally milled at 40 kV but not at 10 kV. However, crystal lattice images and electron diffraction patterns were clearly observed on both the samples. The typical influence of the FIB energy was indicated in the elemental analysis. The relative Ga concentration in the thin sample finally milled at 10 kV was 1.0-2.0 at% that is less than half of 4.0-6.0 at% of the Ga concentration in the sample finally milled at 40 kV. A comparison between the experimental results of the Ga concentration measurement with simulation was also discussed.
机译:已使用Ga聚焦离子束(FIB)铣削在两种不同的10 kV和40 kV工作电压下制备了Mg-Al合金的透射电子显微镜(TEM)样品,以研究FIB能量对样品质量的影响。已使用高分辨率TEM研究了样品的精细结构,并使用能量色散X射线(EDX)分析了注入的Ga的浓度。 TEM观察的结果表明,将点缺陷引入到最终以40kV而不是10kV研磨的样品中。但是,在两个样品上均清楚地观察到晶格图像和电子衍射图。元素分析表明了FIB能量的典型影响。最终在10 kV下研磨的稀薄样品中的相对Ga浓度为1.0-2.0 at%,小于最终在40 kV下研磨的样品中Ga浓度4.0-6.0 at%的一半。还讨论了Ga浓度测量的实验结果与模拟结果之间的比较。

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