All-wet, metal-compatible high-dose-implanted photoresist strip

Totir G.G.; Khojasteh M.; Nunes R.; Cooper E.; Kern M.; Van Berkel K.; Payne M.; Dellaguardia R.; To B.; Maurer S.

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All-wet, metal-compatible high-dose-implanted photoresist strip

机译：全湿金属兼容大剂量植入光刻胶条

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摘要

An all-wet process based on a novel chemistry has been developed to enable the removal of high-dose implanted photoresist in the presence of exposed metal layers and other materials typical of advanced gate stacks.

机译：已经开发出一种基于新型化学方法的全湿工艺，能够在存在暴露的金属层和其他先进栅堆叠典型材料的情况下去除大剂量注入的光刻胶。

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《Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena》 |2012年第null期|共4页
作者
Totir G.G.; Khojasteh M.; Nunes R.; Cooper E.; Kern M.; Van Berkel K.; Payne M.; Dellaguardia R.; To B.; Maurer S.;
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正文语种 eng
中图分类半导体物理学;
关键词
22nm; 32nm; All-wet; Dopant; HDIS; High-k; Implanted resist removal; Metal gate; Selective; Si; TiN;

机译：22nm;32nm;全湿;掺杂剂;HDIS;高k;注入抗蚀剂去除;金属栅极;选择性;Si;TiN;

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专利

1. All-wet, metal-compatible high-dose-implanted photoresist strip [J] . Totir G.G., Khojasteh M., Nunes R., Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2012,第Null期

机译：全湿金属兼容大剂量植入光刻胶条
2. Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist [J] . David DeKraker, Blake Pasker, Jeffery W. Butterbaugh, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2009,第0期

机译：蒸汽注入SPM工艺用于湿法剥离注入的光刻胶
3. All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid [J] . Enrico Bellandi, Mauro AHesandri, Stefan Detterbeck, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2008,第0期

机译：使用硫酸混合物对FEOL光刻胶进行全湿剥离
4. All-wet, metal-compatible high-dose-implanted photoresist strip [C] . George G. Totir, Mahmoud Khojasteh, Ronald Nunes, International Symposium on Ultra Clean Processing of Semiconductor Surfaces . 2012

机译：全湿，金属兼容的高剂量植入光致抗蚀剂带
5. Rational design of non-damaging capacitively coupled plasma etching and photoresist stripping processes for ultralow k dielectric materials. [D] . Kuo, Ming-Shu. 2010

机译：合理设计超低k介电材料的无损电容耦合等离子体蚀刻和光刻胶剥离工艺。
6. Dry Film Photoresist-Based Microfabrication: A New Method to Fabricate Millimeter-Wave Waveguide Components [O] . Sadia Farjana, Mohamadamir Ghaderi, Sofia Rahiminejad, 2021

机译：干膜光致抗蚀剂为基础微制造：制造毫米波波导组分的一种新方法
7. Removal of photoresist and BARC in Cu BEOL using an all-wet process [O] . Q. T. Lea, M. Luxa, Y. Lia, 2016

机译：使用全湿法去除Cu BEOL中的光致抗蚀剂和BaRC
8. Conveyorized Photoresist Stripping Replacement for Flex Circuit Fabrication [R] . Donahue, M. 2009

机译：用于柔性电路制造的输送光刻胶剥离替代品

All-wet, metal-compatible high-dose-implanted photoresist strip

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