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Capacitance-Transient Detection of X-Ray Absorption Fine Structure: A Possible Tool to Analyze the Structure of Deep-Level Centers?

机译:X射线吸收精细结构的电容瞬态检测:一种分析深层中心结构的可能工具?

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The well-established technique of x-ray absorption fine structure (XAFS) near the absorption edge of inner atomic shells reveals valuable information on the microscopic structure of atoms in the solid. Unfortunately, the x-ray absorption of highly diluted defect atoms in the host vanishes in the absorption background from elastic scattering and the absorption from other elements or atomic shells. Recently, a scheme of capacitance-detection for the x-ray absorption fine structure (XAFS) has been reported [M. Ishii, Phys. Rev. B 65, 085310 (2002).] The XAFS signal is detected by the capacitance changes in a Schottky diode. This detection method claimes to give a site-selectivity of the XAFS signal, which would allow detection of the x-ray absorption of only one specific defect site by blocking all other contributions from other sites. In addition to the proposed measurement of the steady-state capacitance we introduce the new detection of capacitance transients. The variation of the characteristic time constant with x-ray absorption gives the XAFS spectrum. Special attention is given to the question if XAFS detected by capacitance can selectively detect strongly diluted defects. The XAFS at the K-edge of arsenic is measured on GaAs Schottky-diodes containing EL2 defect centers. We will give an in-depth discussion of the results and arguments presented by Ishii and co-workers and show that there is at present no evidence for a site-selectivity of capacitance-XAFS.
机译:完善的内部原子壳吸收边缘附近的X射线吸收精细结构(XAFS)技术揭示了有关固体中原子微观结构的有价值的信息。不幸的是,由于弹性散射和其他元素或原子壳的吸收,主体中高度稀释的缺陷原子的X射线吸收在吸收背景中消失了。近来,已经报道了用于X射线吸收精细结构(XAFS)的电容检测方案[M.石井物理学Rev. B 65,085310(2002)。] XAFS信号由肖特基二极管中的电容变化检测。这种检测方法要求给出XAFS信号的位点选择性,这将通过阻止其他位点的所有其他贡献来检测仅一个特定缺陷位点的X射线吸收。除了对稳态电容的建议测量之外,我们还介绍了电容瞬变的新检测方法。特征时间常数随X射线吸收的变化给出了XAFS光谱。特别要注意的问题是,通过电容检测的XAFS是否可以选择性地检测到严重稀释的缺陷。在含EL2缺陷中心的GaAs肖特基二极管上测量砷K边缘的XAFS。我们将对Ishii及其同事提出的结果和论点进行深入讨论,并表明目前尚无证据表明电容XAFS具有位点选择性。

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