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Electric, al Properties of HgCdTe Epilayers Doped with Silver Using an AgNO↓(3) Solution

机译:AgNO↓(3)溶液掺杂银的HgCdTe外延层的电学性能

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We employed AgNO↓(3) solutions for doping Ag in liquid phase epitaxy (LPE) grown Hg↓(0.78)Cd↓(0.22)Te epilayers and found that the minority carrier lifetimes became longer so that the diode properties improved. After annealing LPE grown Hg(1-x)Cd(x)Te layers (x = 0.22) in Hg atmosphere, the epilayers were immersed in an AgNO↓(3) solution at room temperature. The typical carrier concentration of holes was 3 × 10↑(16) cm↑(-3) at 77K. These values were almost the same as for the nondoped wafers. Also, its acceptor level was 3 to 4 meV. This shows that the Ag was activated. The doped crystals have lifetimes several times longer than those of the nondoped crystals. Numerical fitting showed the lifetime was limited mostly by the Auger 7 process. The Shockley-Read-Hall recombination process was not effective. To examine the Ag-doped wafer, we fabricated photodiodes using standard planar technology. The diodes have an average zero-bias resistance of several MΩ and a shunt resistance of about 1 GΩ for a 10 μm cutoff wavelength at 78IC These values are about four times higher than those of nondoped diodes. The photo current is also two times higher at the same pixel size. This shows that the quantum efficiency is increased. The extension of the lifetime contributes to the high resistance and the high quantum efficiency of the photodiode.
机译:我们采用AgNO↓(3)溶液在液相外延(LPE)生长的Hg↓(0.78)Cd↓(0.22)Te外延层中掺杂Ag,发现少数载流子寿命变长,从而改善了二极管的性能。在Hg气氛中对LPE生长的Hg(1-x)Cd(x)Te层(x = 0.22)进行退火后,将外延层在室温下浸入AgNO↓(3)溶液中。空穴在77K时的典型载流子浓度为3×10↑(16)cm↑(-3)。这些值与未掺杂的晶片几乎相同。另外,其受体水平为3至4meV。这表明Ag被激活了。掺杂晶体的寿命是非掺杂晶体的几倍。数值拟合显示寿命主要受Auger 7工艺限制。 Shockley-Read-Hall重组过程无效。为了检查掺银晶片,我们使用标准平面技术制造了光电二极管。二极管在78IC时的截止波长为10μm时,平均零偏置电阻为数MΩ,分流电阻约为1GΩ。这些值比未掺杂二极管的值高大约四倍。在相同像素尺寸下,光电流也要高两倍。这表明量子效率提高了。寿命的延长有助于光电二极管的高电阻和高量子效率。

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