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首页> 外文期刊>Journal of Electronic Materials >Analysis of Leakage Currents in MOCVD Grown GalnAsSb Based Photodetectors Operating at 2 mu m
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Analysis of Leakage Currents in MOCVD Grown GalnAsSb Based Photodetectors Operating at 2 mu m

机译:MOCVD生长的GalnAsSb基光电探测器在2μm下工作时的泄漏电流分析

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This paper reports the fabrication and characterization of GalnAsSb photodetectors operating at 2 mu m.At room temperature,the performance of these photodiodes under reverse bias conditions is limited by the surface leakage.A model has been developed to separate the bulk (diffusion and generation-recombination (g-r)) and the surface leakage contributions toward the total leakage current.By fitting this model to the experimental data,values of material parameters such as minority carrier diffusion length and lifetime have been estimated.The highest R_0A of 55 OMEGA-cm~2 has been obtained with a responsivity of 0.44 AAV at 2 mu m.
机译:本文报道了在2μm下工作的GalnAsSb光电探测器的制造和表征。在室温下,这些光电二极管在反向偏置条件下的性能受到表面泄漏的限制。已经建立了一个模型来分离大块体(扩散和生成-再结合(gr))和表面漏电流对总漏电流的贡献。通过将该模型拟合到实验数据,已估算出诸如少数载流子扩散长度和寿命之类的材料参数值。最高的R_0A为55 OMEGA-cm〜在2 µm处的响应度为0.44 AAV,获得了2。

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