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Influence of Growth Conditions and Surface Reaction Byproducts on GaN Grown via Metal Organic Molecular Beam Epitaxy:Toward an Understanding of Surface Reaction Chemistry

机译:生长条件和表面反应副产物对金属有机分子束外延生长GaN的影响:对表面反应化学的理解

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The surface reaction byproducts during the growth of GaN films via metal organic molecular beam epitaxy (MOMBE)were investigated as a means to optimize material properties.Ethylene and ethane were identified as the dom-inant surface reaction hydrocarbon byproducts,averaging 27.63percent and 7.15percent of the total gas content present during growth.Intense ultraviolet (UV)photo-excitation during growth was found to significantly increase the abundance of ethylene and ethane while reducing the presence of H_2 and N_2.At 920 deg C,UV excitation was shown to enhance growth rate and crystalline quality while reducing carbon incorporation.Over a limited growth condition range,a 4.5 X 10~(19)-3.4 X 10~(20)cm~(-3)variation in carbon incorporation was achieved at con-stant high vacuum.Coupled with growth rate gains,UV excitation yielded films with approx 58percent less integrated carbon content.Structural material property variations are reported for various ammonia flows and growth temperatures.The results suggest that high carbon incorporation can be achieved and regu-lated during MOMBE growth and that in-situ optimization through hydro-carbon analysis may provide further enhancement in the allowable carbon concentration range.
机译:研究了通过金属有机分子束外延(MOMBE)生长GaN薄膜过程中的表面反应副产物,以优化材料性能。乙烯和乙烷被认为是主要的表面反应烃副产物,分别占27.63%和7.15%发现在生长过程中强烈的紫外线(UV)光激发能显着增加乙烯和乙烷的丰度,同时减少H_2和N_2的存在。在920摄氏度时,UV激发显示出在有限的生长条件范围内,在恒定的高温下实现了4.5 X 10〜(19)-3.4 X 10〜(20)cm〜(-3)的碳掺入变化真空。加上生长速率的提高,紫外线激发产生的薄膜的总碳含量降低了约58%。 es。结果表明,在MOMBE生长期间可以实现并控制高碳掺入,通过碳氢化合物分析进行的原位优化可以进一步提高允许的碳浓度范围。

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