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Optically Detected Magnetic Resonance Study of Defects in Undoped, Be-doped, and Mg-doped GaN

机译:对未掺杂,被掺杂和镁掺杂的GaN中的缺陷进行光学检测的磁共振研究

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摘要

Undoped, Be-doped, and Mg-doped GaN samples were investigated with photo-luminescence-detected electron paramagnetic resonance (PL-EPR) and electron-nuclear double resonance (PL-ENDOR). Two types of shallow donors and a deep level Be-related complex were measured in Be-doped GaN. One type of shallow donors is probably due to Si contamination. In all investigated samples, distant gallium ENDOR lines were observed which were split by a quadrupole interaction. From this splitting the electrical field gradients (efg's) at the Ga nuclei in all investigated samples could be determined very precisely. The efg's were correlated with strain.
机译:利用光致发光检测的电子顺磁共振(PL-EPR)和电子核双共振(PL-ENDOR)研究了未掺杂,Be掺杂和Mg掺杂的GaN样品。在掺杂Be的GaN中测量了两种类型的浅施主和深能级Be相关复合物。一种浅施主可能是由于Si污染。在所有研究的样品中,观察到了远距离的ENDOR镓线,这些线被四极相互作用所分裂。通过这种分裂,可以非常精确地确定所有研究样品中Ga核处的电场梯度(efg)。 efg与应变相关。

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