Thickness Dependence Study of Electron Beam Evaporated LBMO Manganite Thin Films for Bolometer Applications

摘要

La_(0.7)Ba_(0.3)MnO_3 (LBMO) thin films with different thicknesses were deposited on Si substrates using an electron beam evaporation technique for bolometer applications. To evaluate the influence of the thickness on their structural, compositional, morphological, and electrical properties, the LBMO thin films were characterized by x-ray diffraction (XRD), energy-dispersive spectroscopy, atomic force microscopy, and a four-probe method. XRD measurements showed that the crystal quality of the LBMO films improved with increasing thickness. The surface morphology revealed that the grain size and surface roughness of the films increased with increasing thickness. The resistivity increased with increasing thickness of the film. The temperature coefficient of resistance of the LBMO films decreased from 5.15%/K to 4.12%/K with increase of the film thickness from 20 nm to 100 nm.