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首页> 外文期刊>Journal of Electronic Materials >Interfacial Reaction Between Sn3.0Ag0.5Cu Solder and ENEPIG for Fine Pitch BGA by Stencil Printing
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Interfacial Reaction Between Sn3.0Ag0.5Cu Solder and ENEPIG for Fine Pitch BGA by Stencil Printing

机译:细孔印刷BGA的Sn3.0Ag0.5Cu焊料与ENEPIG的模版印刷界面反应

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摘要

In this work, solder balls in ball grid array packaging technology with the pitch of 300 mu m were fabricated by stencil printing solder paste and then reflowed at high temperature. In order to evaluate the quality of solder ball after printing and reflowing processes, the mechanical performance of the joint between the solder balls and the pad was measured by shear test and the electrical resistance was tested after assembly of the substrate and printed circuit board. A comparative study of pad size on the interfacial reaction between solder paste and surface finish of electroless nickel-electroless palladium-immersion gold on the organic substrate was performed and then analyzed by observing the microstructure at the interface. Large discontinuous (Cu,Ni)(6)Sn-5 was found at the interface of the solder with the pad size of 120 mu m, while spalled (Pd,Ni)Sn-4 and thin (Cu,Ni)(6)Sn-5 layer appeared for a pad size of 140 mu m. The IMC (intermetallic compounds) was determined by the residual Cu concentration, the Pd concentration in the solder, and the Ni2SnP barrier layer morphology at the interface, which were significantly influenced by the pad size. A reaction model during the reflow was proposed to illustrate the growth of the IMC and the relationship between the IMC and the pad size. With Pd concentration higher than the solubility of Pd in the solder, spalled (Pd,Ni)Sn-4 took shape along the interface. The solubility of Pd was influenced by Ni concentration; however, the Ni diffusion from the substrate was largely dependent on the barrier layer Ni2SnP. Furthermore, the Ni diffusion also impacted the growth and morphology of (Cu,Ni)(6)Sn-5, which was not only limited by the Cu concentration.
机译:在这项工作中,通过模版印刷焊膏制造了球栅阵列封装技术中的锡球,间距为300微米,然后在高温下回流。为了评估印刷和回流工艺后焊球的质量,通过剪切测试测量了焊球和焊盘之间的接合点的机械性能,并在基板和印刷电路板组装之后测试了电阻。进行了焊盘尺寸对锡膏与有机衬底上化学镀镍-化学钯浸金的表面光洁度之间的界面反应的比较研究,然后通过观察界面处的微观结构进行了分析。在焊料的界面处发现大的不连续(Cu,Ni)(6)Sn-5,焊盘尺寸为120μm,而(Pd,Ni)Sn-4散裂而薄(Cu,Ni)(6) Sn-5层出现在140微米的焊盘上。 IMC(金属间化合物)由残留的铜浓度,焊料中的Pd浓度以及界面处的Ni2SnP势垒层形貌决定,而焊盘尺寸会显着影响其形成。提出了回流过程中的反应模型,以说明IMC的增长以及IMC与焊盘尺寸之间的关系。当Pd的浓度高于Pd在焊料中的溶解度时,沿着界面形成散裂的(Pd,Ni)Sn-4。 Pd的溶解度受Ni浓度的影响。然而,Ni从衬底的扩散很大程度上取决于势垒层Ni 2 SnP。此外,Ni的扩散还影响了(Cu,Ni)(6)Sn-5的生长和形貌,这不仅受Cu浓度的限制。

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