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Photoluminescence of ZnO:Ga Thin Films Fabricated by Pulsed Laser Deposition Technique

机译:脉冲激光沉积技术制备的ZnO:Ga薄膜的光致发光

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摘要

Highly c-axis oriented Ga-doped ZnO films (GZO) have been grown on sapphire (0001) substrates by pulsed laser deposition (PLD) method. Photoluminescence (PL) spectra indicate that Ga atoms have a large effect on the luminescent properties of ZnO films. PL spectra of GZO films show near band edge (NBE) emissions and broad orange deep-level emissions. The NBE emission shifts to higher energy region and the intensity decreases with the increase of Ga concentration. The blue shift of NBE emission results from Burstein-Moss effect. The quenching of NBE emission is ascribed to the noradiative recombination. The orange emission is related to the oxygen vacancies.
机译:通过脉冲激光沉积(PLD)方法,在蓝宝石(0001)衬底上生长了高度c轴取向的Ga掺杂ZnO薄膜(GZO)。光致发光(PL)光谱表明,Ga原子对ZnO薄膜的发光性能影响很大。 GZO膜的PL光谱显示了近带边缘(NBE)发射和宽橙色深层发射。 NBE的发射转移到较高的能量区域,并且强度随着Ga浓度的增加而降低。 NBE发射的蓝移是由Burstein-Moss效应引起的。 NBE发射的淬灭归因于辐射重组。橙色排放与氧空位有关。

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