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首页> 外文期刊>Journal of electroceramics >Ferroelectric Properties of (Bi,Sm){sub}4Ti{sub}3O{sub}12 (BST) Thin Films Fabricated by a Metalorganic Solution Deposition Method
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Ferroelectric Properties of (Bi,Sm){sub}4Ti{sub}3O{sub}12 (BST) Thin Films Fabricated by a Metalorganic Solution Deposition Method

机译:金属有机溶液沉积法制备(Bi,Sm){sub} 4Ti {sub} 3O {sub} 12(BST)薄膜的铁电性能

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摘要

Ferroelectric properties of samarium substituted Bi{sub}4Ti{sub}3O{sub}12 films, Bi{sub}3.15Sm{sub}0.85Ti{sub}3O{sub}12 (BST), were evaluated for use as lead-free thin film ferroelectrics for FeRAM applications. The BST films were fabricated on the Pt/Ti/SiO{sub}2/Si(100) substrates by a metalorganic solution deposition method. The measured XRD patterns revealed that the BST films showed only a Bi4Ti{sub}3O{sub}12-type phase with a random orientation. The BST film capacitors showed excellent ferroelectric properties. For the film capacitor annealed at 700℃, 2P{sub}r of 64,2 μC/cm{sup}2 and 2E{sub}c of 101.7 kV/cm at applied electric field of 150 kV/cm were observed. The capacitor did not show any significant fatigue up to 1.5 × 10{sup}8 read/write switching cycles at a frequency of 1 MHz, which suggests that the samarium should be considered for a promising lanthanide elements to make a good thin ferroelectric film for memory applications.
机译:评估了substituted替代的Bi {sub} 4Ti {sub} 3O {sub} 12薄膜(Bi {sub} 3.15Sm {sub} 0.85Ti {sub} 3O {sub} 12(BST))的铁电性能,用于FeRAM应用的免费薄膜铁电体。通过金属有机溶液沉积方法在Pt / Ti / SiO {sub} 2 / Si(100)衬底上制备BST膜。测量的XRD图谱表明,BST膜仅显示具有随机取向的Bi4Ti {sub} 3O {sub} 12型相。 BST薄膜电容器表现出出色的铁电性能。对于在700℃退火的薄膜电容器,在150 kV / cm的施加电场下观察到2P {r}为64,2μC/ cm {sup} 2和2E {c} c为101.7 kV / cm。在频率为1 MHz时,该电容器在1.5×10 {sup} 8个读/写切换周期内没有表现出任何明显的疲劳,这表明for应被认为是有前途的镧系元素,以制造出良好的铁电薄膜。内存应用程序。

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