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Investigation of top electrode for PZT thick films based MEMS sensors

机译:基于PZT厚膜MEMS传感器的顶部电极的研究

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In this work processing of screen printed piezoelectric PZT thick films on silicon substrates is investigated for use in future MEMS devices. E-beam evaporated Al and Pt are patterned on PZT as a top electrode using a lift-off process with a line width down to 3 μm. Three test structures are used to investigate the optimal thickness of the top electrode, the degradation of the piezoelectric properties of the PZT film in absence of a diffusion barrier layer and finally how to fabricate electrical interconnects down the edge of the PZT thick film. The roughness of the PZT is found to have a strong influence on the conductance of the top electrode influencing the optimal top electrode thickness. A 100 nm thick top electrode on the PZT thick film with a surface roughness of 273 nm has a 4.5 times higher resistance compared to a similar wire on a planar SiO_2 surface which has a surface roughness of less than 10 nm. It is found that the piezoelectric properties of the PZT thick film are degraded up to 1,000 μm away from a region of the PZT thick film that is exposed directly to the silicon substrate without a diffusion barrier layer. Finally, ferroelectric hysteresis loops are used to verify that the piezoelectric properties of the PZT thick film are unchanged after the processing of the top electrode.
机译:在这项工作中,研究了在硅基板上丝网印刷压电PZT厚膜的工艺,以用于未来的MEMS器件。使用剥离工艺将电子束蒸发的Al和Pt图案化为PZT上的顶部电极,线宽低至3μm。使用三个测试结构来研究顶部电极的最佳厚度,在没有扩散阻挡层的情况下PZT膜的压电性能的下降以及最终如何在PZT厚膜的边缘制作电互连。发现PZT的粗糙度对顶部电极的电导有很大影响,影响了最佳的顶部电极厚度。表面粗糙度为273 nm的PZT厚膜上的100 nm厚的顶部电极的电阻是表面粗糙度小于10 nm的平面SiO_2表面上类似导线的4.5倍。已经发现,在没有扩散阻挡层的情况下,从直接暴露于硅基板的PZT厚膜的区域离开PZT厚膜的区域,直到1,000μm为止,压电特性劣化。最后,铁电磁滞回线用于验证顶电极处理后PZT厚膜的压电特性没有改变。

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