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首页> 外文期刊>Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry >An improved algorithm for the numerical simulation of cyclic voltammetric curves affected by the ohmic potential drops and its application to the kinetics of bis(biphenyl)chromium(I) electroreduction
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An improved algorithm for the numerical simulation of cyclic voltammetric curves affected by the ohmic potential drops and its application to the kinetics of bis(biphenyl)chromium(I) electroreduction

机译:欧姆电位降影响循环伏安曲线数值模拟的改进算法及其在双(联苯基)铬(I)电还原动力学中的应用

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摘要

Previously published algorithms for the modeling of cyclic voltammetric curves affected by ohmic potential drops, in terms of the classical explicit finite differences method, are discussed briefly. A fast and efficient numerical procedure suitable for such simulations is described. This approach exhibits high numerical stability for both high scan rates and large uncompensated ohmic resistances. The procedure is based on the calculation of the faradaic current as a root of the non-linear equation, with a simultaneous calculation of the capacitive current. Comparison of the cyclic voltammograms obtained using this method with those calculated using alternative published procedures proves its validity. For comparison with the experimental data, the cyclic voltammetric response for the reduction of bis(biphenyl)chromium(l) tetraphenylborate in N,N-dimethylformamide is shown and the kinetic parameters of this process are fitted. Compared to earlier modelings, they show better concordance with the results of studies at microelectrodes. In conjunction with earlier successful applications of the analogous numerical procedure to the realistic modeling of electrochemical oscillations and multistability at a constant external voltage, the algorithm presented appears to be one of the most applicable methods of calculation of the electrochemical responses affected by the ohmic potential drops. (C) 2004 Elsevier B.V. All rights reserved.
机译:根据经典的显式有限差分法,简要讨论了先前发布的用于建模受欧姆电势降影响的循环伏安曲线的算法。描述了适用于这种模拟的快速有效的数值程序。这种方法对于高扫描速率和大的未补偿欧姆电阻均显示出很高的数值稳定性。该过程基于作为非线性方程式根的法拉第电流的计算以及电容电流的同时计算。使用此方法获得的循环伏安图与使用替代公开程序计算的循环伏安图进行比较,证明了其有效性。为了与实验数据进行比较,显示了在N,N-二甲基甲酰胺中还原四苯基硼酸双(联苯)铬(l)的循环伏安响应,并拟合了该过程的动力学参数。与早期的建模相比,它们与微电极的研究结果显示出更好的一致性。结合类似数值过程的较早成功应用,可以在恒定外部电压下对电化学振荡和多稳定性进行真实建模,提出的算法似乎是计算最受欧姆电位降影响的电化学响应的最适用方法之一。 (C)2004 Elsevier B.V.保留所有权利。

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