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X-ray absorption in relation to valency of iridium in sputtered iridium oxide films

机译:X射线吸收与溅射氧化铱薄膜中铱价的关系

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Electronic and structural changes induced by the charge storage reaction due to proton insertion in sputtered iridium oxide films (SIROFs) have been invstigated by in situ X-ray absorption spectroscopy at the L_3 edge of iridium atoms in 1 M H_2SO_4. The iridium valency is shown to increase from 3 to 3.85 when the potential varies from -0.2 to +1 V(SCE). In XANES spectra, the white line peak height and energy position decrease with insertion. The fine structures of the spectra have been analyzed and simulated in view of structural parameter extraction. A correspondence curve is established between the interatomic Ir-O distance in the first shell and the iridium valency. A strong decrease of this distance is observed with the oxidation state of iridium accompanied by a conspicuous decrease of the Debye-Waller factor.
机译:在1 M H_2SO_4中,通过铱原子L_3边缘的原位X射线吸收光谱研究了由于质子插入溅射的氧化铱膜(SIROFs)中而由电荷存储反应引起的电子和结构变化。当电势从-0.2变化到+1 V(SCE)时,铱价数从3增加到3.85。在XANES光谱中,白线峰高和能量位置随插入而降低。鉴于结构参数提取,已经对光谱的精细结构进行了分析和模拟。在第一壳中的原子间Ir-O距离与铱化合价之间建立了对应曲线。在铱的氧化态伴随着Debye-Waller因子显着降低的情况下,观察到该距离的强烈减小。

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