首页> 外文期刊>Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry >STUDY OF THE EQUILIBRIUM UNDERPOTENTIAL DEPOSITION OF COPPER AND THE ACCOMPANYING ANION ADSORPTION ON RHODIZED ELECTRODES IN THE COURSE OF CYCLIC VOLTAMMETRIC MEASUREMENTS
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STUDY OF THE EQUILIBRIUM UNDERPOTENTIAL DEPOSITION OF COPPER AND THE ACCOMPANYING ANION ADSORPTION ON RHODIZED ELECTRODES IN THE COURSE OF CYCLIC VOLTAMMETRIC MEASUREMENTS

机译:循环伏安测量过程中铜在阴极上的平衡欠平衡沉积和阴离子的吸附研究

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摘要

The adsorption of HSO4- (SO42-) and Cl- ions was studied by a radiotracer technique in the course of the formation and dissolution of a copper adatom layer at a rhodized electrode during cyclic voltammetric measurements. It was found that no significant change occurs in the apparent anion adsorption during the formation of the adlayer. The explanation of this observation is presented in the light of experimental results reported in the present and previous papers. [References: 15]
机译:在循环伏安法测量过程中,通过放射性示踪技术研究了在铑电极上铜吸附原子层的形成和溶解过程中,HSO4-(SO42-)和Cl-离子的吸附。发现在形成附加层期间,表观阴离子吸附没有发生明显变化。根据本论文和以前的论文中报道的实验结果对这一观察结果进行了解释。 [参考:15]

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