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Influence of water addition on the structure of plasma-deposited allyl alcohol polymer films

机译:加水量对等离子沉积烯丙醇聚合物薄膜结构的影响

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摘要

One hundred and fifty nanometre thick polymer films made of allyl alcohol and H2O addition were deposited onto aluminium substrates using the radio-frequency (rf) pulsed plasma mode. The structure-property relationships of polymer films were studied in dependence on the precursor ratio allyl alcohol-water. Both the regularity of structure and composition of such thin films in comparison to chemically polymerized allyl alcohol were investigated using by bulk-sensitive Fourier transform infrared spectroscopy (FTIR) in the spectral range of 4000-500cm(-1) as well as surface-sensitive X-ray photoelectron spectroscopy (XPS). The intention of this work was to increase the yield in OH groups by addition of water to the allyl alcohol precursor. For an unambiguous identification of the functionality of the deposited films, the OH groups were labelled with trifluoroacetic anhydride and subsequently measured by XPS as well as quantitatively by FTIR. As expected, the O/C ratio grew with increasing water admixture by oxidation of both the plasma polymerized allyl alcohol layer to preferably aldehyde and/or carboxylic acid groups. In contrary, the concentration of OH groups in the deposited polymer film decreases dramatically with increasing admixture of water to the allyl alcohol plasma. It has been shown that the additional water has produced preferably higher oxidized C-O-x species with two or three C-O bonds. This fits also very well with the observation that almost no deuterium is introduced into the surface of plasma polymer if D2O was added instead of H2O.
机译:使用射频(RF)脉冲等离子体模式,将由烯丙醇和H2O加成而成的150纳米厚的聚合物膜沉积到铝基板上。根据烯丙醇-水的前驱体比率研究了聚合物薄膜的结构-性质关系。通过体敏傅里叶变换红外光谱(FTIR)在4000-500cm(-1)的光谱范围内以及表面敏感的范围内,研究了与化学聚合的烯丙醇相比,此类薄膜的结构和组成的规则性。 X射线光电子能谱(XPS)。这项工作的目的是通过向烯丙醇前体中添加水来提高OH基团的产率。为了清楚地确定沉积膜的功能,用三氟乙酸酐标记OH基,然后通过XPS以及FTIR进行定量。如所预期的,通过将等离子体聚合的烯丙醇层都氧化成优选为醛基和/或羧酸基团,O / C比随着水掺混物的增加而增加。相反,随着水与烯丙醇等离子体的掺混增加,沉积的聚合物膜中的OH基浓度急剧降低。已经表明,额外的水优选产生具有两个或三个C-O键的较高氧化的C-O-x物质。这也非常符合以下观察结果:如果添加D2O代替H2O,几乎不会将氘引入等离子体聚合物的表面。

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