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Adhesion Enhancement of Electroplated Cu/Electroless Ni Composite Layer to (PMDA-ODA)-Type Polyimide Films

机译:电镀铜/化学镀镍复合层对(PMDA-ODA)型聚酰亚胺膜的附着力增强

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摘要

In order to improve the adhesion strength of electroplated Cu/electrolessly plated Ni (EN)/PI laminates,four kinds of potassium hydroxide (KOH)-based solutions with different amounts of ethylenediamine were prepared and the surfaces of pyromellitic dianhydride-oxydianiline (PMDA-ODA)-type polyimide (PI) films were modified with these solutions.The surface of PI films was characterized by contact-angle measurements,X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM).The surface energy of PI films was calculated by the Owens-Wendt equation using the contact angle data of de-ionized water and diiodomethane (purity 99%).Adhesion strength of modified Cu/Ni/PI laminates was measured in terms of peel strength using the T-peel test.The results showed that the surface energy of PI films increased from 38.9 (unmodified) to 65.9 mJ/m~2 (modified with solution No.4,i.e.,solution containing 5 mol/l KOH and 90 mol/l ethylenediamine,for 180 s).XPS spectra showed that the surface of modified PI films incorporated a potassium-based product which is due to the formation of potassium polyamate in the modified layer through imide ring-cleavage reactions.AFM results revealed that the surface modification decreased the surface roughness of PI films,which is ascribed to the removal of the surface protrusions by etching during the modification process,and also revealed that it is desirable to modify PI films with a KOH-based solution containing a suitable amount of organic additive (ethylenediamine) to obtain a smooth EN layer.The T-peel test results showed that the peel strength of Cu/Ni/PI laminate reached a maximum when the PI film was modified with solution No.4.The correlation between the peel strength and the surface energy of PI films revealed that the enhanced peel strength was mainly attributable to the increased surface energy of PI films by the modification process.
机译:为了提高电镀铜/化学镀镍(EN)/ PI层压板的粘合强度,制备了具有不同乙二胺含量的四种基于氢氧化钾(KOH)的溶液,并制备了均苯四酸二酐-氧化二苯胺(PMDA-用这些溶液对ODA)型聚酰亚胺(PI)薄膜进行了改性。通过接触角测量,X射线光电子能谱(XPS)和原子力显微镜(AFM)对PI薄膜的表面进行了表征。使用去离子水和二碘甲烷(纯度为99%)的接触角数据,通过Owens-Wendt方程计算得出。改性的Cu / Ni / PI层压板的粘合强度通过T-剥离试验测量剥离强度。结果表明,PI薄膜的表面能从38.9(未改性)提高到65.9 mJ / m〜2(用4号溶液改性,即含有5 mol / l KOH和90 mol / l乙二胺的溶液改性180 s)。 XPS光谱表明表面改性的PI膜中掺入了钾基产品,这是由于通过酰亚胺环裂解反应在改性层中形成了聚氨基甲酸钾.AFM结果表明表面改性降低了PI膜的表面粗糙度,这归因于通过在改性过程中通过蚀刻去除表面突起,还表明希望使用含有适量有机添加剂(乙二胺)的KOH基溶液对PI膜进行改性,以获得光滑的EN层。试验结果表明,用4号溶液对PI薄膜进行改性后,Cu / Ni / PI层压板的剥离强度达到最大值。剥离强度与表面能的相关性表明,增强的剥离强度主要是归因于改性过程增加了PI膜的表面能。

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