首页> 外文期刊>Journal of Applied Polymer Science >STRUCTURE AND PROPERTIES OF TIN-CONTAINING POLYMERS DEPOSITED FROM TETRAMETHYLTIN HF PLASMA
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STRUCTURE AND PROPERTIES OF TIN-CONTAINING POLYMERS DEPOSITED FROM TETRAMETHYLTIN HF PLASMA

机译:叔丁基锡高频等离子体沉积含锡聚合物的结构与性能

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摘要

There has been an increasing interest in depositing metal or metal-containing thin films through plasma polymerization for various applications. This work deals with the plasma graft polymerization of tetramethyltin (TMT) on polypropylene surfaces with an aim of producing special electrical and optical coatings. The fragmentation of TMT under cold plasma conditions and the recombination of discharge-generated active species were studied by analyzing the resulting molecular mixture trapped outside of the plasma zone by HR-MS and GC-MS techniques. It was found that the predominant ionic fragment is m/z = 165, and the most probable intermediate structure of the polymer formation mechanism is hexamethylditin. The structure of polymeric layers deposited on various substrates were investigated by ESCA and FT-IR methods. Intense oxidation of tin-based polymeric layers were observed under open laboratory conditions. The existence of weak Sn-Sn and Sn-C bonds in the polymeric structures is suggested to be responsible for this reaction. This phenomenon was associated with enhanced UV transparency. Based on analytical data a plasma-enhanced polymerization mechanism of TMT is proposed. (C) 1995 John Wiley & Sons, Inc. [References: 21]
机译:通过等离子体聚合来沉积金属或含金属的薄膜以用于各种应用的兴趣日益增加。这项工作涉及四甲基锡(TMT)在聚丙烯表面上的等离子接枝聚合,目的是生产特殊的电气和光学涂层。通过利用HR-MS和GC-MS技术分析了捕获在等离子体区外的分子混合物,研究了冷等离子体条件下TMT的碎片化和放电产生的活性物质的重组。发现主要的离子片段是m / z = 165,并且聚合物形成机理的最可能的中间结构是六甲基二锡。通过ESCA和FT-IR方法研究了沉积在各种基材上的聚合物层的结构。在开放实验室条件下观察到锡基聚合物层的强烈氧化。建议在聚合物结构中存在弱的Sn-Sn和Sn-C键是造成此反应的原因。这种现象与增强的紫外线透明度有关。基于分析数据,提出了TMT的等离子体增强聚合机理。 (C)1995 John Wiley&Sons,Inc. [参考:21]

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