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首页> 外文期刊>Journal of Applied Crystallography >Harmonic composition of synchrotron white-beam X-ray topographic back-reflection images of basal-cut silicon carbide single-crystal wafers
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Harmonic composition of synchrotron white-beam X-ray topographic back-reflection images of basal-cut silicon carbide single-crystal wafers

机译:基切碳化硅单晶晶片的同步加速器白光束X射线形貌背反射图像的谐波成分

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摘要

Superscrew dislocations are visible in back-reflection synchrotron white-beam X-ray topographs of basal-cut SiC wafers in striking contrast as black rings surrounding white circles, even though such topographs suffer from extensive harmonic contamination. The contributions to the synchrotron whitebeam topograph of each member of its series of harmonic reflections, g = (0006n), where n = 3 to 16, were calculated. Through intensity considerations and comparison with a g = 00018 topograph taken with Cu K alpha(1) radiation, the g = 00024 harmonic was determined to be the most important contributor. The contrast of features lying deep beneath the crystal's surface was attributed to higher harmonics with larger penetration depths. [References: 4]
机译:在基底切割的SiC晶片的背反射同步加速器白光X射线形貌图中,与环绕白色圆圈的黑环形成鲜明对比时,可以看到超螺旋位错,即使这种形貌受到广泛的谐波污染。计算出其谐波反射系列的每个成员对同步辐射白光束形貌的贡献,其中g =(0006n),其中n = 3至16。通过强度考虑和与使用Cu K alpha(1)辐射获得的g = 00018地形图进行比较,确定g = 00024谐波是最重要的因素。位于晶体表面深处的特征的对比度归因于较高的谐波和较大的穿透深度。 [参考:4]

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