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首页> 外文期刊>Journal of Applied Electrochemistry >Current efficiency and kinetics of cobalt electrodeposition in acid chloride solutions. Part II: The influence of chloride and sulphate concentrations
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Current efficiency and kinetics of cobalt electrodeposition in acid chloride solutions. Part II: The influence of chloride and sulphate concentrations

机译:酰氯溶液中钴电沉积的电流效率和动力学。第二部分:氯化物和硫酸盐浓度的影响

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摘要

The influence of cobalt chloride concentration, total chloride concentration and sulphate in the electrolyte on cobalt deposition were studied. The current efficiency increased and the overpotential for electrodeposition of cobalt decreased with increasing cobalt chloride concentration. Only minor changes were observed with addition of sodium chloride to the cobalt chloride solution. Sulphate electrolyte resulted in lower current efficiency and higher overpotential for electrodeposition when compared to a similar cobalt chloride electrolyte.
机译:研究了电解液中氯化钴浓度,总氯化物浓度和硫酸盐对钴沉积的影响。随着氯化钴浓度的增加,电流效率增加,钴的电沉积过电位降低。在氯化钴溶液中添加氯化钠后,观察到的变化很小。与类似的氯化钴电解质相比,硫酸盐电解质导致较低的电流效率和较高的电沉积超电势。

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