首页> 外文会议>Applications of process engineering principles in materials processing, energy and environmental technologies >Cobalt Electrodeposition from Cobalt Chloride Using Urea and Choline Chloride Ionic Liquid: Effect of Temperature, Applied Voltage, and Cobalt Chloride Concentration on Current Efficiency and Energy Consumption
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Cobalt Electrodeposition from Cobalt Chloride Using Urea and Choline Chloride Ionic Liquid: Effect of Temperature, Applied Voltage, and Cobalt Chloride Concentration on Current Efficiency and Energy Consumption

机译:使用尿素和氯化胆碱离子液体从氯化钴中电解沉积钴:温度,施加电压和氯化钴浓度对电流效率和能量消耗的影响

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Electrodeposition of cobalt from cobalt chloride using the urea and the choline chloride ionic liquid (2:1 molar ratio) was studied to search the optimized parameters for the higher current efficiency. The cyclic voltammetry was tested with 0.2 M CoCl_2 using various scan rates to determine the reduction potential in Urea/ChCl at 323 K. Based on the data from cyclic voltammetry test, the transfer coefficient and the diffusion coefficient were calculated as 0.22 and 3.38 × 10~(-6) cm~2/s, respectively. The parameters for electrodeposition of cobalt were various temperatures (323-383 K), applied potentials (2.4-3.3 V), and concentration of CoCl_2 (0.2-0.5 mol/L). Current efficiency and energy consumption were calculated to investigate the optimal condition for the electrodeposition of cobalt. The highest current efficiency (95%) was obtained under the temperature 323 K, the applied voltage 2.7 V, and concentration 0.5 mol/L of CoCl_2. Scanning electron microscope (SEM) and X-ray diffraction (XRD) were used for the characterization of cobalt deposits.
机译:研究了使用尿素和氯化胆碱离子液体(摩尔比为2:1)从氯化钴电解沉积钴的过程,以寻找优化的参数以提高电流效率。使用各种扫描速率在0.2 M CoCl_2上测试循环伏安法,以确定323 K下Urea / ChCl的还原电位。基于循环伏安法测试的数据,传输系数和扩散系数分别为0.22和3.38×10分别约为(-6)cm〜2 / s。电沉积钴的参数是各种温度(323-383 K),施加电势(2.4-3.3 V)和CoCl_2的浓度(0.2-0.5 mol / L)。计算电流效率和能耗以研究电沉积钴的最佳条件。在323 K的温度,2.7 V的施加电压和0.5 mol / L的CoCl_2浓度下获得了最高的电流效率(95%)。扫描电子显微镜(SEM)和X射线衍射(XRD)用于表征钴沉积物。

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