Using CD-SEM metrology in the manufacture of semiconductors

摘要

Automated scanning electron microscopy tools are employed in semiconductor manufacturing to monitor the pattern-transfer process. Both feedback and feedforward information are used to control the process. The challenge for this nondestructiveevaluation technique is not the instrumentation, but rather the intelligent use of the feedback and feedforward metrology inputs so that the process produces a product within specification with a minimal deviation because of in-time process driftcorrection.