X-ray reflectometry allows to determine the thickness, the density and the rugosity of thin layers on a substrate from several nanometers to some hundred nanometers. The thickness is determined by simulation with trial-and-error methods after extracting start values of the layer thicknesses from the result of a classical FFT of the reflectivity data. Nevertheless, the optimization of the direct model gives satisfactory results only if the number of parameters remains limited and if each parameter is known within a narrow variation range. This study demonstrates that the wavelet analysis applied on experimental reflectivity curves gives a good knowledge of the stack leading to a realistic starting vector for the trial-and-erroe method.
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