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Anomalous Hall effect in polycrystalline Mn (x) Si1-x (x a parts per thousand 0.5) films with the self-organized distribution of crystallites over their shapes and sizes

机译:多晶Mn(x)Si1-x(x千分之一0.5)薄膜中的异常霍尔效应,其晶体的形状和尺寸具有自组织分布

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摘要

The structural, transport, and magnetic characteristics of polycrystalline Mn (x) Si1-x (x a parts per thousand 0.51-0.52) films grown by pulsed laser deposition onto Al2O3(0001) substrates when the low-energy components are deposited owing to collisions with the atoms of the buffer gas have been studied in the "shadow" geometry. The magnetization of these films is determined by two ferromagnetic phases-the high-temperature phase with the Curie temperature T (C) a parts per thousand 370 K and the low-temperature one with T (C) a parts per thousand 46 K. The anomalous Hall effect changes sign from positive to negative with a decrease in temperature. The sign change occurs in the temperature range of 30-50 K; the specific value of this temperature depends on the thickness of the Mn (x) Si1-x film. The results can be interpreted in terms of the structural self-organization related to the formation of two layers in the course of film growth. These layers have nearly the same chemical composition but significantly differ in the shapes and sizes of crystallites. This leads to a drastic difference in the values of T (C) and in the value and the sign of the anomalous Hall effect for such layers.
机译:当由于碰撞而沉积低能成分时,通过脉冲激光沉积到Al2O3(0001)衬底上而生长的多晶Mn(x)Si1-x(xa千分之0.51-0.52)薄膜的结构,输运和磁性缓冲气体的原子已经以“阴影”几何形状进行了研究。这些薄膜的磁化强度由两个铁磁相决定,高温相居里温度T(C)为千分之370 K,而低温相居中T(C)为千分之46K。随着温度的降低,异常霍尔效应将正负号从正变为负。符号变化发生在30-50 K的温度范围内。该温度的特定值取决于Mn(x)Si1-x膜的厚度。结果可以用与膜生长过程中形成两层有关的结构自组织来解释。这些层具有几乎相同的化学组成,但微晶的形状和大小明显不同。这导致T(C)的值以及此类层的异常霍尔效应的值和符号之间的巨大差异。

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