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Diamond surfaces polished both mechanically and manually; an atomic force microscopy (AFM) study

机译:机械和手动抛光金刚石表面;原子力显微镜(AFM)研究

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Diamond surfaces that are polished both mechanically and manually have been studied using atomic force microscopy and compared with optical micrographs obtained within the Nomarski interference mode. The extra gentle manual polishing which follows the mechanical polishing was developed to produce much smoother, well characterized and flat diamond surfaces than those prepared through mechanical polishing only. Both the AFM and optical micrographs showed the manually polished diamond surfaces being smoother and also exhibiting lower roughness parameters than those polished mechanically only. Annealing the surfaces to 250 deg C did not show any noticeable changes in the surface roughnesses, but a 750 deg C vacuum-anneal did show some differences that were attributed to possible surface etching through the desorption of the surface-bonded species.
机译:机械和手动抛光的金刚石表面已经使用原子力显微镜进行了研究,并与在Nomarski干涉模式下获得的光学显微照片进行了比较。与仅通过机械抛光制备的金刚石相比,在机械抛光之后进行的特别轻柔的手动抛光可产生出更光滑,特征明确且平坦的金刚石表面。原子力显微镜和光学显微照片均显示,与仅机械抛光的钻石相比,手动抛光的钻石表面更光滑,并且粗糙度参数也较低。将表面退火至250摄氏度并没有显示出表面粗糙度的任何明显变化,但是在750摄氏度的真空退火中确实显示出一些差异,这归因于通过表面键合物质的解吸可能进行的表面蚀刻。

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