Adherent and low friction nano-crystalline diamond film grown on titanium using microwave CVD plasma

摘要

The use of titanium alloys for aerospace and biomedical applications could increase if their tribological behavior was improved. The deposition of an adherent diamond coating can resolve this issue. However, due to the different thermal expansion coefficients of the two materials, it is difficult to grow adherent thin diamond layers on Ti and its metallic alloys. In the present work microwave plasma chemical vapor deposition (MWPCVD) was used to deposit smooth nano-crystalline diamond (NCD) film on pure titanium substrate using Ar, CH4 and H_2 gases at moderate deposition temperatures. Of particular interest in this study was the exceptional adhesion of approximately 2 mu m-thick diamond film to the metal substrate as observed by indentation testing up to 150 kg load. The friction coefficient, which was measured with a cemented carbide ball of 10 mm diameter with 20 N load, was estimated to be around 0.04 in dry air. Morphology, surface roughness, diamond crystal orientation and quality were obtained by characterizing the sample with field emission electron microscopy (FE-SEM), atomic force microscopy (AFM), X-ray diffraction (XRD) and Raman spectroscopy, respectively.