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Mapping of extended defects in B-doped (001) homoepitaxial diamond films by electron-beam-induced current (EBIC) and cathodoluminescence (CL) combination technique

机译:通过电子束感应电流(EBIC)和阴极发光(CL)组合技术绘制B掺杂(001)同质外延金刚石膜中扩展缺陷的映射

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摘要

We have studied on a spatial distribution of extended defects with shell-shape pits in B-doped (001) homoepitaxial diamond films using electron-beam-induced current (EBIC) and cathodoluminescence (CL) combination technique. The EBIC image corresponded to the comprehensive one of band-A emission (430 nm) in CL measurements. In addition, both EBIC and CL images also corresponded to optical microscope image (Nomarski) with shell-shape pits. These experimental results' indicate that the shell-shape pits are accompanied with localized electrically-active-defects originating from extended defects such as dislocation with band-A CL emission. It is suggested that extended defects such as dislocations result in the formation of shell-shape pits.
机译:我们使用电子束感应电流(EBIC)和阴极发光(CL)组合技术研究了B掺杂(001)同质外延金刚石膜中带有壳形凹坑的扩展缺陷的空间分布。 EBIC图像与CL测量中的波段A发射(430 nm)全面对应。此外,EBIC和CL图像也都对应于具有壳形凹坑的光学显微镜图像(Nomarski)。这些实验结果表明,壳形的凹坑伴随着局部的电活性缺陷,这些缺陷源于扩展的缺陷,例如带A CL发射的位错。有人提出,诸如位错之类的延伸缺陷会导致壳形凹坑的形成。

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